Training MaterialĪll of our training material is created by memsstar based upon our wealth of experience and knowledge, and is delivered by fully qualified and certified technical trainers. Courses include up to 8 students per class, with training ideally split between classroom and access to equipment. Operators, maintenance technicians, equipment engineers, process engineers, development engineers, and health & safety practitioners. Memsstar technical training takes place at the customer site, and is delivered after careful consultation to identify the correct training products for your business needs. Vacuum supply for Robot: 11.8”Hg(-5.8psi) / 0.Professional training is an important enabler for our customers, to make sure that the skills and knowledge exist within your operation to get the best machine performance and cost of ownership. MFC /w In-line Filter and Solenoid Isolation ValveĬooling water: 1GPM house circulating supply <23 ± 2☌įacility Exhaust: 100 CFM 1” static pressure Keyboard, Mouse, USB SW backup, and Cables Main Frame with Circuit Breakers, Solenoid Valves

*Contact Allwin21 sales for other applications and specifications  MTBF/MTTA/MTTR: 450 Hours/100 Hours/3.5 Hours or Better. Reliability and production-proven technology. The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexibleġ3.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume waferįabrication.

PC controller with Advanced Allwin21 Software.Įndpoint detection (EOP) with Allwin21 SLOPE technology (Optional).Īir-Cooled 600W MKS 13.56 MHz RF Generator (300W Option). Up to 4 wafer size capability without hardware change.įixed cassette station and wafer aligner/cooling station. Best for III-V Materials.įrontside and backside isotropic removal.Ĭonsistent wafer-to-wafer process cycle repeatability.ĥ0mm-150mm wafer capability. Integrated solid robotic wafer handling, Single wafer process. Production-proven plasma Asher/Descum system. GaAs, InP, GaN, SiC wafer Descum (Mainly) The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology. The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication.

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